JPH0244326U - - Google Patents

Info

Publication number
JPH0244326U
JPH0244326U JP12304188U JP12304188U JPH0244326U JP H0244326 U JPH0244326 U JP H0244326U JP 12304188 U JP12304188 U JP 12304188U JP 12304188 U JP12304188 U JP 12304188U JP H0244326 U JPH0244326 U JP H0244326U
Authority
JP
Japan
Prior art keywords
gas injection
electrode
magnetic field
chamber
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12304188U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12304188U priority Critical patent/JPH0244326U/ja
Publication of JPH0244326U publication Critical patent/JPH0244326U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12304188U 1988-09-19 1988-09-19 Pending JPH0244326U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12304188U JPH0244326U (en]) 1988-09-19 1988-09-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12304188U JPH0244326U (en]) 1988-09-19 1988-09-19

Publications (1)

Publication Number Publication Date
JPH0244326U true JPH0244326U (en]) 1990-03-27

Family

ID=31371533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12304188U Pending JPH0244326U (en]) 1988-09-19 1988-09-19

Country Status (1)

Country Link
JP (1) JPH0244326U (en])

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6094725A (ja) * 1983-10-28 1985-05-27 Hitachi Ltd ドライエツチング装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置
JPS62299031A (ja) * 1986-06-18 1987-12-26 Nec Corp 平行平板型エツチング装置の電極構造

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6094725A (ja) * 1983-10-28 1985-05-27 Hitachi Ltd ドライエツチング装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置
JPS62299031A (ja) * 1986-06-18 1987-12-26 Nec Corp 平行平板型エツチング装置の電極構造

Similar Documents

Publication Publication Date Title
JPH0311440U (en])
JPH0244326U (en])
JPH0183067U (en])
JPH0469465U (en])
JPH0464566U (en])
JPS63112745U (en])
JPH0479420U (en])
JPS6237200U (en])
JPH0245628U (en])
JPS6274332U (en])
JP2536880Y2 (ja) ガスクロマトグラフ用検出器のノズル印加構造
JPS6026099Y2 (ja) プラズマ重合装置の内部電極構造
JPS6255564U (en])
JPH0521246Y2 (en])
JPH0242427U (en])
JPS61203341U (en])
JPS61188352U (en])
JPH029857U (en])
JPH0247030U (en])
JPH0197549U (en])
JPH0246398U (en])
JPS626832U (en])
JPH0245629U (en])
JPH0165132U (en])
JPS6214724U (en])